NanoCalc Thin Film Reflectometry
System
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The optical properties of thin films arise from reflection and
interference. The NanoCalc Thin Film Reflectometry System allows you to analyze the
thickness of optical layers from
10 nm to ~250 µm.. You can observe a single thickness with a resolution of 0.1 nm. Depending on your software choice, you can analyze single-layer or multilayer films in less than one second and can measure the thickness and removal rates of semiconductor process films or anti-scratch coatings, hard coatings and anti-reflection coatings. |
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Features
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Analyze
single- or multi-layer films
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Resolution
to 0.1 nm
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Ideal for in situ, on-line thickness measurements
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Convenient preconfigured
options for VIS and UV-VIS applications
Theory of Operation
The two most common ways to measure thin film characteristics are spectral reflectance/transmission and ellipsometry. NanoCalc utilizes the reflectance method and measures the amount of light reflected from a thin film over a range of
wavelengths, with the incident light normal to the sample surface.
Search by n and k
As many as ten layers can be specified in a film stack. The various films and substrate materials can be metallic, dielectric, amorphous or crystalline
semiconductors. The NanoCalc Software includes a large library of n and k values for the most common materials. You can edit and add to this library. Also, you can define material types by equation or dispersion formulas.
Applications
NanoCalc Thin Film Reflectometry Systems are ideal for in situ, on-line thickness measurements and removal rate applications, and can be used to measure the thickness of oxides, SiNx, photoresist and other semiconductor process films. NanoCalc Systems measure anti-reflection coatings, anti-scratch coatings and rough layers on substrates such as steel, aluminum, brass, copper, ceramics and plastics.
NanoCalc Systems
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NANOCALC
VIS-PRECON |
NANOCALC
XR-PRECON |
NANOCALC-DUV |
| Wavelength range: |
400-850 nm |
250-1050 nm |
~200-1100 nm |
| Thickness range: |
50 nm - 20
µm |
10 nm - 100
µm |
1 nm - 100 µm |
| Optical resolution: |
0.1 nm |
0.1 nm |
0.1 nm |
| Repeatability: |
0.3 nm |
0.3 nm |
0.3 nm |
| Angle of incidence: |
90º |
90º |
90º |
| Number of layers: |
Up to 10 |
Up to 10 |
Up to 10 |
| Refractive index: |
Yes |
Yes |
|
| Test materials: |
Transparent or semi-transparent
thin film materials |
Transparent or semi-transparent
thin film materials |
Transparent or semi-transparent
thin film materials |
| Reference needed: |
Yes (bare substrate) |
Yes (bare substrate) |
Yes (bare substrate) |
| Measurement modes: |
Reflection and Transmission |
Reflection and Transmission |
Reflection and Transmission |
| Rough materials
capable: |
Yes |
Yes |
Yes |
| Measurement speed: |
100 ms to 1 s |
100 ms to 1 s |
100 ms to 1 s |
| On-line capable: |
Yes |
Yes |
Yes |
| Height adjustment: |
With COL-UV-6.35 (10-50 mm) |
With COL-UV-6.35 (10-50 mm) |
With COL-UV-6.35 (10-50 mm) |
| Spot size: |
200 µm or 400 µm standard
100 µm available upon request |
200 µm or 400 µm standard
100 µm available upon request |
400 µm standard
200 µm available upon request |
| Microspot: |
Yes (with microscope) |
Yes (with microscope) |
Yes (with microscope) |
| CCD color: |
Yes (with microscope) |
Yes (with microscope) |
Yes (with microscope) |
| Mapping option: |
150 mm (6") and 300 mm
(12") xy-scanning stages |
150 mm (6") and 300 mm
(12") xy-scanning stages |
150 mm (6") and 300 mm
(12") xy-scanning stages |
| Vacuum capable: |
Yes |
Yes |
Yes |
* For Reflectometry applications, the following items are required:
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NC-2UV-VIS100-2
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Bifurcated UV fiber
400 µm x 2m
2x SMA connectors
Flexible metal jacketing |
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NC-STATE |
Single point reflection measurement
for non transparent samples |
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Step-Wafer |
5 Steps 0-500 mm, calibrated 4" |
* If using a microscope, the following items are also needed:
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NC-7UV-VIS200-2
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Reflection probe for application
microscopy with MFA-C-Mount |
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Step-Wafer |
5 Steps 0-500 mm, calibrated 4" |
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